Cargando…
Glow discharge processes: sputtering and plasma etching
| Autor principal: | |
|---|---|
| Lenguaje: | eng |
| Publicado: |
Wiley
1980
|
| Materias: | |
| Acceso en línea: | http://cds.cern.ch/record/103991 |
| _version_ | 1780876990982651904 |
|---|---|
| author | Chapman, Brian N |
| author_facet | Chapman, Brian N |
| author_sort | Chapman, Brian N |
| collection | CERN |
| id | cern-103991 |
| institution | Organización Europea para la Investigación Nuclear |
| language | eng |
| publishDate | 1980 |
| publisher | Wiley |
| record_format | invenio |
| spelling | cern-1039912021-04-22T05:53:19Zhttp://cds.cern.ch/record/103991engChapman, Brian NGlow discharge processes: sputtering and plasma etchingEngineeringWileyoai:cds.cern.ch:1039911980 |
| spellingShingle | Engineering Chapman, Brian N Glow discharge processes: sputtering and plasma etching |
| title | Glow discharge processes: sputtering and plasma etching |
| title_full | Glow discharge processes: sputtering and plasma etching |
| title_fullStr | Glow discharge processes: sputtering and plasma etching |
| title_full_unstemmed | Glow discharge processes: sputtering and plasma etching |
| title_short | Glow discharge processes: sputtering and plasma etching |
| title_sort | glow discharge processes: sputtering and plasma etching |
| topic | Engineering |
| url | http://cds.cern.ch/record/103991 |
| work_keys_str_mv | AT chapmanbriann glowdischargeprocessessputteringandplasmaetching |