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Deposition of thin metal films by means of arc discharges under ultra-high vacuum conditions

Detalles Bibliográficos
Autores principales:	Sadowski, M J, Strzyzewski, P, Nietubyc, R
Lenguaje:	eng
Publicado:	2007
Materias:	Accelerators and Storage Rings
Acceso en línea:	http://cds.cern.ch/record/1091541

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