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MAPS in 130 nm triple well CMOS technology for HEP applications
Deep N-well CMOS monolithic active pixel sensors (DNWMAPS) represent an alternative approach to signal processing in pixellated detectors for high energy physics experiments. Based on different resolution constraints, two prototype MAPS, suitable for applications requiring different detector pitch,...
Autores principales: | , , , , , |
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Lenguaje: | eng |
Publicado: |
CERN
2007
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Materias: | |
Acceso en línea: | https://dx.doi.org/10.5170/CERN-2007-007.492 http://cds.cern.ch/record/1091744 |
_version_ | 1780913795544121344 |
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author | Pozzati, E Manghisoni, M Ratti, L Re, V Speziali, V Traversi, G |
author_facet | Pozzati, E Manghisoni, M Ratti, L Re, V Speziali, V Traversi, G |
author_sort | Pozzati, E |
collection | CERN |
description | Deep N-well CMOS monolithic active pixel sensors (DNWMAPS) represent an alternative approach to signal processing in pixellated detectors for high energy physics experiments. Based on different resolution constraints, two prototype MAPS, suitable for applications requiring different detector pitch, have been developed and fabricated in 130 nm triple well CMOS technology. This work presents experimental results from the characterization of some test structures together with TCAD and Monte Carlo simulations intended to study the device properties in terms of charge diffusion and charge sharing among pixels. |
id | cern-1091744 |
institution | Organización Europea para la Investigación Nuclear |
language | eng |
publishDate | 2007 |
publisher | CERN |
record_format | invenio |
spelling | cern-10917442019-09-30T06:29:59Zdoi:10.5170/CERN-2007-007.492http://cds.cern.ch/record/1091744engPozzati, EManghisoni, MRatti, LRe, VSpeziali, VTraversi, GMAPS in 130 nm triple well CMOS technology for HEP applicationsAccelerators and Storage RingsDeep N-well CMOS monolithic active pixel sensors (DNWMAPS) represent an alternative approach to signal processing in pixellated detectors for high energy physics experiments. Based on different resolution constraints, two prototype MAPS, suitable for applications requiring different detector pitch, have been developed and fabricated in 130 nm triple well CMOS technology. This work presents experimental results from the characterization of some test structures together with TCAD and Monte Carlo simulations intended to study the device properties in terms of charge diffusion and charge sharing among pixels.CERNoai:cds.cern.ch:10917442007 |
spellingShingle | Accelerators and Storage Rings Pozzati, E Manghisoni, M Ratti, L Re, V Speziali, V Traversi, G MAPS in 130 nm triple well CMOS technology for HEP applications |
title | MAPS in 130 nm triple well CMOS technology for HEP applications |
title_full | MAPS in 130 nm triple well CMOS technology for HEP applications |
title_fullStr | MAPS in 130 nm triple well CMOS technology for HEP applications |
title_full_unstemmed | MAPS in 130 nm triple well CMOS technology for HEP applications |
title_short | MAPS in 130 nm triple well CMOS technology for HEP applications |
title_sort | maps in 130 nm triple well cmos technology for hep applications |
topic | Accelerators and Storage Rings |
url | https://dx.doi.org/10.5170/CERN-2007-007.492 http://cds.cern.ch/record/1091744 |
work_keys_str_mv | AT pozzatie mapsin130nmtriplewellcmostechnologyforhepapplications AT manghisonim mapsin130nmtriplewellcmostechnologyforhepapplications AT rattil mapsin130nmtriplewellcmostechnologyforhepapplications AT rev mapsin130nmtriplewellcmostechnologyforhepapplications AT spezialiv mapsin130nmtriplewellcmostechnologyforhepapplications AT traversig mapsin130nmtriplewellcmostechnologyforhepapplications |