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International Conference on Ion Implantation in Semiconductors

Detalles Bibliográficos
Autor principal: Hohmuth, K
Lenguaje:eng
ger
Publicado: Rossendorf Fachinformations-Zentrum. Zentral-Inst. 1978
Materias:
Acceso en línea:http://cds.cern.ch/record/119695
_version_ 1780879160859688960
author Hohmuth, K
author_facet Hohmuth, K
author_sort Hohmuth, K
collection CERN
id cern-119695
institution Organización Europea para la Investigación Nuclear
language eng
ger
publishDate 1978
publisher Rossendorf Fachinformations-Zentrum. Zentral-Inst.
record_format invenio
spelling cern-1196952021-04-22T21:50:48Zhttp://cds.cern.ch/record/119695enggerHohmuth, KInternational Conference on Ion Implantation in SemiconductorsInternational Conference on Ion Implantation in SemiconductorsOther Fields of PhysicsRossendorf Fachinformations-Zentrum. Zentral-Inst.ZFK-360ZFK-360-Aoai:cds.cern.ch:1196951978
spellingShingle Other Fields of Physics
Hohmuth, K
International Conference on Ion Implantation in Semiconductors
title International Conference on Ion Implantation in Semiconductors
title_full International Conference on Ion Implantation in Semiconductors
title_fullStr International Conference on Ion Implantation in Semiconductors
title_full_unstemmed International Conference on Ion Implantation in Semiconductors
title_short International Conference on Ion Implantation in Semiconductors
title_sort international conference on ion implantation in semiconductors
topic Other Fields of Physics
url http://cds.cern.ch/record/119695
work_keys_str_mv AT hohmuthk internationalconferenceonionimplantationinsemiconductors