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Progress on large area GEMs (VCI 2010)
The Gas Electron Multiplier (GEM) manufacturing technique has recently evolved to allow the production of large area GEMs. A novel approach based on single mask photolithography eliminates the mask alignment issue, which limits the dimensions in the traditional double mask process. Moreover, a splic...
| Autores principales: | , , , , , , , , , |
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| Lenguaje: | eng |
| Publicado: |
2010
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| Materias: | |
| Acceso en línea: | https://dx.doi.org/10.1016/j.nima.2010.06.312 http://cds.cern.ch/record/1276679 |