New developments in Micromegas Microbulk detectors

A new Micromegas manufacturing technique, based on kapton etching technology, has been recently developed, improving the uniformity and stability of this kind of readouts. Excellent energy resolutions have been obtained, reaching 11% FWHM for the 5.9 keV photon peak of 55Fe source and 1.8% FWHM for...

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Detalles Bibliográficos
Autores principales: Iguaz, F.J., Andriamonje, S., Belloni, F., Berthoumieux, E., Calviani, M., Dafni, T., De Oliveira, R., Ferrer-Ribas, E., Galan, J., Garcia, J.A., Giomataris, I., Guerrero, C., Gunsing, F., Herrera, D.C., Irastorza, I.G., Papaevangelou, T., Rodriguez, A., Tomas, A.
Lenguaje:eng
Publicado: 2011
Materias:
Detectors and Experimental Techniques
Acceso en línea:https://dx.doi.org/10.1016/j.phpro.2012.02.392
http://cds.cern.ch/record/1390053

Internet

https://dx.doi.org/10.1016/j.phpro.2012.02.392
http://cds.cern.ch/record/1390053

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