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Comparison of impurity defect structures formed by ion implantations in amorphous and crystalline silicon
Autores principales: | Weyer, G, Damgaard, S, Petersen, J W, Heinemeier, J |
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Lenguaje: | eng |
Publicado: |
1982
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Materias: | |
Acceso en línea: | https://dx.doi.org/10.1016/0167-5087(82)90250-2 http://cds.cern.ch/record/142454 |
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