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Batch By Batch Longitudinal Emittance Blowup MD
The transverse bunch emittance increases significantly at 450 GeV from the time of injection till the ramp due to IBS. By selectively blowing up the longitudinal emittance of the incoming batch at each injection, it should be possible to reduce the transverse emittance growth rates due to IBS. An MD...
Autores principales: | , , , , |
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Lenguaje: | eng |
Publicado: |
2012
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Materias: | |
Acceso en línea: | http://cds.cern.ch/record/1455658 |
Sumario: | The transverse bunch emittance increases significantly at 450 GeV from the time of injection till the ramp due to IBS. By selectively blowing up the longitudinal emittance of the incoming batch at each injection, it should be possible to reduce the transverse emittance growth rates due to IBS. An MD was conducted on April 22nd 2012 to test the feasibility and performance of the batch-by-batch longitudinal emittance blowup. There were three main goals during the MD. First, to test the developed hardware, firmware, and software for the batch-by-batch blowup. Then, to measure the transverse emittance growth rates of blown-up and "witness" batches to quantify any improvement, and finally to test the ALLInjectSequencer class, which deals with the complicated gymnastics of introducing or masking the new batch to various RF loops. |
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