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Nanoimprint lithography: an enabling process for nanofabrication
Nanoimprint Lithography: An enabling process for nanofabrication presents a comprehensive description of nanotechnology that is one of the most promising low-cost, high-throughput technologies for manufacturing nanostructures, and an emerging lithography candidates for 22, 16 and 11 nm nodes. It pro...
Autor principal: | Zhou, Weimin |
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Lenguaje: | eng |
Publicado: |
Springer
2013
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Materias: | |
Acceso en línea: | https://dx.doi.org/10.1007/978-3-642-34428-2 http://cds.cern.ch/record/1518683 |
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