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Photomechanical and chemical etching techniques
Autor principal: | |
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Lenguaje: | eng |
Publicado: |
1974
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Materias: | |
Acceso en línea: | http://cds.cern.ch/record/1528817 |
_version_ | 1780929520310681600 |
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author | CERN. Geneva. Super Proton Synchrotron Division (SPS) |
author_facet | CERN. Geneva. Super Proton Synchrotron Division (SPS) |
author_sort | CERN. Geneva. Super Proton Synchrotron Division (SPS) |
collection | CERN |
id | cern-1528817 |
institution | Organización Europea para la Investigación Nuclear |
language | eng |
publishDate | 1974 |
record_format | invenio |
spelling | cern-15288172023-05-26T09:58:52Zhttp://cds.cern.ch/record/1528817engCERN. Geneva. Super Proton Synchrotron Division (SPS)Photomechanical and chemical etching techniquesDetectors and Experimental TechniquesCERN-Technology-Note-W29oai:cds.cern.ch:15288171974 |
spellingShingle | Detectors and Experimental Techniques CERN. Geneva. Super Proton Synchrotron Division (SPS) Photomechanical and chemical etching techniques |
title | Photomechanical and chemical etching techniques |
title_full | Photomechanical and chemical etching techniques |
title_fullStr | Photomechanical and chemical etching techniques |
title_full_unstemmed | Photomechanical and chemical etching techniques |
title_short | Photomechanical and chemical etching techniques |
title_sort | photomechanical and chemical etching techniques |
topic | Detectors and Experimental Techniques |
url | http://cds.cern.ch/record/1528817 |
work_keys_str_mv | AT cerngenevasuperprotonsynchrotrondivisionsps photomechanicalandchemicaletchingtechniques |