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Advanced plasma technology
A panel of internationally renowned scientists discuss the latest results in plasma technology. This volume has been compiled with both a didactic approach and an overview of the newest achievements for industrial applications. It is divided into two main sections. One is focused on fundamental tech...
| Autores principales: | , , , , , |
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| Lenguaje: | eng |
| Publicado: |
Wiley
2008
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| Materias: | |
| Acceso en línea: | http://cds.cern.ch/record/1609898 |
| _version_ | 1780931977223864320 |
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| author | d'Agostino , Riccardo Favia, Pietro Kawai, Yoshinobu Ikegami, Hideo Sato, Noriyoshi Arefi-Khonsari, Farzaneh |
| author_facet | d'Agostino , Riccardo Favia, Pietro Kawai, Yoshinobu Ikegami, Hideo Sato, Noriyoshi Arefi-Khonsari, Farzaneh |
| author_sort | d'Agostino , Riccardo |
| collection | CERN |
| description | A panel of internationally renowned scientists discuss the latest results in plasma technology. This volume has been compiled with both a didactic approach and an overview of the newest achievements for industrial applications. It is divided into two main sections. One is focused on fundamental technology, including plasma production and control, high-pressure discharges, modeling and simulation, diagnostics, dust control, and etching. The section on application technology covers polymer treatments, silicon solar cell, coating and spray, biomaterials, sterilization and waste treatment, plasma |
| id | cern-1609898 |
| institution | Organización Europea para la Investigación Nuclear |
| language | eng |
| publishDate | 2008 |
| publisher | Wiley |
| record_format | invenio |
| spelling | cern-16098982019-09-30T06:29:59Zhttp://cds.cern.ch/record/1609898engd'Agostino , RiccardoFavia, PietroKawai, YoshinobuIkegami, HideoSato, NoriyoshiArefi-Khonsari, FarzanehAdvanced plasma technologyXXA panel of internationally renowned scientists discuss the latest results in plasma technology. This volume has been compiled with both a didactic approach and an overview of the newest achievements for industrial applications. It is divided into two main sections. One is focused on fundamental technology, including plasma production and control, high-pressure discharges, modeling and simulation, diagnostics, dust control, and etching. The section on application technology covers polymer treatments, silicon solar cell, coating and spray, biomaterials, sterilization and waste treatment, plasma Wileyoai:cds.cern.ch:16098982008 |
| spellingShingle | XX d'Agostino , Riccardo Favia, Pietro Kawai, Yoshinobu Ikegami, Hideo Sato, Noriyoshi Arefi-Khonsari, Farzaneh Advanced plasma technology |
| title | Advanced plasma technology |
| title_full | Advanced plasma technology |
| title_fullStr | Advanced plasma technology |
| title_full_unstemmed | Advanced plasma technology |
| title_short | Advanced plasma technology |
| title_sort | advanced plasma technology |
| topic | XX |
| url | http://cds.cern.ch/record/1609898 |
| work_keys_str_mv | AT dagostinoriccardo advancedplasmatechnology AT faviapietro advancedplasmatechnology AT kawaiyoshinobu advancedplasmatechnology AT ikegamihideo advancedplasmatechnology AT satonoriyoshi advancedplasmatechnology AT arefikhonsarifarzaneh advancedplasmatechnology |