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Ferroelectric dielectrics integrated on silicon
This book describes up-to-date technology applied to high-K materials for More Than Moore applications, i.e. microsystems applied to microelectronics core technologies.After detailing the basic thermodynamic theory applied to high-K dielectrics thin films including extrinsic effects, this book empha...
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Lenguaje: | eng |
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Wiley-ISTE
2013
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Acceso en línea: | http://cds.cern.ch/record/1616863 |
_version_ | 1780932703731843072 |
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author | Defay, Emmanuel |
author_facet | Defay, Emmanuel |
author_sort | Defay, Emmanuel |
collection | CERN |
description | This book describes up-to-date technology applied to high-K materials for More Than Moore applications, i.e. microsystems applied to microelectronics core technologies.After detailing the basic thermodynamic theory applied to high-K dielectrics thin films including extrinsic effects, this book emphasizes the specificity of thin films. Deposition and patterning technologies are then presented. A whole chapter is dedicated to the major role played in the field by X-Ray Diffraction characterization, and other characterization techniques are also described such as Radio frequency characterizat |
id | cern-1616863 |
institution | Organización Europea para la Investigación Nuclear |
language | eng |
publishDate | 2013 |
publisher | Wiley-ISTE |
record_format | invenio |
spelling | cern-16168632021-04-21T22:03:49Zhttp://cds.cern.ch/record/1616863engDefay, EmmanuelFerroelectric dielectrics integrated on siliconEngineeringThis book describes up-to-date technology applied to high-K materials for More Than Moore applications, i.e. microsystems applied to microelectronics core technologies.After detailing the basic thermodynamic theory applied to high-K dielectrics thin films including extrinsic effects, this book emphasizes the specificity of thin films. Deposition and patterning technologies are then presented. A whole chapter is dedicated to the major role played in the field by X-Ray Diffraction characterization, and other characterization techniques are also described such as Radio frequency characterizatWiley-ISTEoai:cds.cern.ch:16168632013 |
spellingShingle | Engineering Defay, Emmanuel Ferroelectric dielectrics integrated on silicon |
title | Ferroelectric dielectrics integrated on silicon |
title_full | Ferroelectric dielectrics integrated on silicon |
title_fullStr | Ferroelectric dielectrics integrated on silicon |
title_full_unstemmed | Ferroelectric dielectrics integrated on silicon |
title_short | Ferroelectric dielectrics integrated on silicon |
title_sort | ferroelectric dielectrics integrated on silicon |
topic | Engineering |
url | http://cds.cern.ch/record/1616863 |
work_keys_str_mv | AT defayemmanuel ferroelectricdielectricsintegratedonsilicon |