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Ferroelectric dielectrics integrated on silicon

This book describes up-to-date technology applied to high-K materials for More Than Moore applications, i.e. microsystems applied to microelectronics core technologies.After detailing the basic thermodynamic theory applied to high-K dielectrics thin films including extrinsic effects, this book empha...

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Autor principal: Defay, Emmanuel
Lenguaje:eng
Publicado: Wiley-ISTE 2013
Materias:
Acceso en línea:http://cds.cern.ch/record/1616863
_version_ 1780932703731843072
author Defay, Emmanuel
author_facet Defay, Emmanuel
author_sort Defay, Emmanuel
collection CERN
description This book describes up-to-date technology applied to high-K materials for More Than Moore applications, i.e. microsystems applied to microelectronics core technologies.After detailing the basic thermodynamic theory applied to high-K dielectrics thin films including extrinsic effects, this book emphasizes the specificity of thin films. Deposition and patterning technologies are then presented. A whole chapter is dedicated to the major role played in the field by X-Ray Diffraction characterization, and other characterization techniques are also described such as Radio frequency characterizat
id cern-1616863
institution Organización Europea para la Investigación Nuclear
language eng
publishDate 2013
publisher Wiley-ISTE
record_format invenio
spelling cern-16168632021-04-21T22:03:49Zhttp://cds.cern.ch/record/1616863engDefay, EmmanuelFerroelectric dielectrics integrated on siliconEngineeringThis book describes up-to-date technology applied to high-K materials for More Than Moore applications, i.e. microsystems applied to microelectronics core technologies.After detailing the basic thermodynamic theory applied to high-K dielectrics thin films including extrinsic effects, this book emphasizes the specificity of thin films. Deposition and patterning technologies are then presented. A whole chapter is dedicated to the major role played in the field by X-Ray Diffraction characterization, and other characterization techniques are also described such as Radio frequency characterizatWiley-ISTEoai:cds.cern.ch:16168632013
spellingShingle Engineering
Defay, Emmanuel
Ferroelectric dielectrics integrated on silicon
title Ferroelectric dielectrics integrated on silicon
title_full Ferroelectric dielectrics integrated on silicon
title_fullStr Ferroelectric dielectrics integrated on silicon
title_full_unstemmed Ferroelectric dielectrics integrated on silicon
title_short Ferroelectric dielectrics integrated on silicon
title_sort ferroelectric dielectrics integrated on silicon
topic Engineering
url http://cds.cern.ch/record/1616863
work_keys_str_mv AT defayemmanuel ferroelectricdielectricsintegratedonsilicon