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Silicon technologies: ion implantation and thermal treatment
The main purpose of this book is to remind new engineers in silicon foundry, the fundamental physical and chemical rules in major Front end treatments: oxidation, epitaxy, ion implantation and impurities diffusion.
| Autor principal: | |
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| Lenguaje: | eng |
| Publicado: |
Wiley-ISTE
2013
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| Materias: | |
| Acceso en línea: | http://cds.cern.ch/record/1616870 |
| _version_ | 1780932704823410688 |
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| author | Baudrant, Annie |
| author_facet | Baudrant, Annie |
| author_sort | Baudrant, Annie |
| collection | CERN |
| description | The main purpose of this book is to remind new engineers in silicon foundry, the fundamental physical and chemical rules in major Front end treatments: oxidation, epitaxy, ion implantation and impurities diffusion. |
| id | cern-1616870 |
| institution | Organización Europea para la Investigación Nuclear |
| language | eng |
| publishDate | 2013 |
| publisher | Wiley-ISTE |
| record_format | invenio |
| spelling | cern-16168702021-04-21T22:03:47Zhttp://cds.cern.ch/record/1616870engBaudrant, AnnieSilicon technologies: ion implantation and thermal treatmentEngineeringThe main purpose of this book is to remind new engineers in silicon foundry, the fundamental physical and chemical rules in major Front end treatments: oxidation, epitaxy, ion implantation and impurities diffusion. Wiley-ISTEoai:cds.cern.ch:16168702013 |
| spellingShingle | Engineering Baudrant, Annie Silicon technologies: ion implantation and thermal treatment |
| title | Silicon technologies: ion implantation and thermal treatment |
| title_full | Silicon technologies: ion implantation and thermal treatment |
| title_fullStr | Silicon technologies: ion implantation and thermal treatment |
| title_full_unstemmed | Silicon technologies: ion implantation and thermal treatment |
| title_short | Silicon technologies: ion implantation and thermal treatment |
| title_sort | silicon technologies: ion implantation and thermal treatment |
| topic | Engineering |
| url | http://cds.cern.ch/record/1616870 |
| work_keys_str_mv | AT baudrantannie silicontechnologiesionimplantationandthermaltreatment |