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Silicon technologies: ion implantation and thermal treatment
The main purpose of this book is to remind new engineers in silicon foundry, the fundamental physical and chemical rules in major Front end treatments: oxidation, epitaxy, ion implantation and impurities diffusion.
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| Lenguaje: | eng |
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Wiley-ISTE
2013
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| Acceso en línea: | http://cds.cern.ch/record/1616870 |