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Nano lithography
Lithography is an extremely complex tool - based on the concept of "imprinting" an original template version onto mass output - originally using relatively simple optical exposure, masking, and etching techniques, and now extended to include exposure to X-rays, high energy UV light, and el...
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Lenguaje: | eng |
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Wiley-ISTE
2013
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Materias: | |
Acceso en línea: | http://cds.cern.ch/record/1617140 |
_version_ | 1780932721502060544 |
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author | Landis, Stefan |
author_facet | Landis, Stefan |
author_sort | Landis, Stefan |
collection | CERN |
description | Lithography is an extremely complex tool - based on the concept of "imprinting" an original template version onto mass output - originally using relatively simple optical exposure, masking, and etching techniques, and now extended to include exposure to X-rays, high energy UV light, and electron beams - in processes developed to manufacture everyday products including those in the realms of consumer electronics, telecommunications, entertainment, and transportation, to name but a few. In the last few years, researchers and engineers have pushed the envelope of fields including optics, physics, |
id | cern-1617140 |
institution | Organización Europea para la Investigación Nuclear |
language | eng |
publishDate | 2013 |
publisher | Wiley-ISTE |
record_format | invenio |
spelling | cern-16171402021-04-21T22:03:18Zhttp://cds.cern.ch/record/1617140engLandis, StefanNano lithographyEngineeringLithography is an extremely complex tool - based on the concept of "imprinting" an original template version onto mass output - originally using relatively simple optical exposure, masking, and etching techniques, and now extended to include exposure to X-rays, high energy UV light, and electron beams - in processes developed to manufacture everyday products including those in the realms of consumer electronics, telecommunications, entertainment, and transportation, to name but a few. In the last few years, researchers and engineers have pushed the envelope of fields including optics, physics,Wiley-ISTEoai:cds.cern.ch:16171402013 |
spellingShingle | Engineering Landis, Stefan Nano lithography |
title | Nano lithography |
title_full | Nano lithography |
title_fullStr | Nano lithography |
title_full_unstemmed | Nano lithography |
title_short | Nano lithography |
title_sort | nano lithography |
topic | Engineering |
url | http://cds.cern.ch/record/1617140 |
work_keys_str_mv | AT landisstefan nanolithography |