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Nano lithography

Lithography is an extremely complex tool - based on the concept of "imprinting" an original template version onto mass output - originally using relatively simple optical exposure, masking, and etching techniques, and now extended to include exposure to X-rays, high energy UV light, and el...

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Autor principal: Landis, Stefan
Lenguaje:eng
Publicado: Wiley-ISTE 2013
Materias:
Acceso en línea:http://cds.cern.ch/record/1617140
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author Landis, Stefan
author_facet Landis, Stefan
author_sort Landis, Stefan
collection CERN
description Lithography is an extremely complex tool - based on the concept of "imprinting" an original template version onto mass output - originally using relatively simple optical exposure, masking, and etching techniques, and now extended to include exposure to X-rays, high energy UV light, and electron beams - in processes developed to manufacture everyday products including those in the realms of consumer electronics, telecommunications, entertainment, and transportation, to name but a few. In the last few years, researchers and engineers have pushed the envelope of fields including optics, physics,
id cern-1617140
institution Organización Europea para la Investigación Nuclear
language eng
publishDate 2013
publisher Wiley-ISTE
record_format invenio
spelling cern-16171402021-04-21T22:03:18Zhttp://cds.cern.ch/record/1617140engLandis, StefanNano lithographyEngineeringLithography is an extremely complex tool - based on the concept of "imprinting" an original template version onto mass output - originally using relatively simple optical exposure, masking, and etching techniques, and now extended to include exposure to X-rays, high energy UV light, and electron beams - in processes developed to manufacture everyday products including those in the realms of consumer electronics, telecommunications, entertainment, and transportation, to name but a few. In the last few years, researchers and engineers have pushed the envelope of fields including optics, physics,Wiley-ISTEoai:cds.cern.ch:16171402013
spellingShingle Engineering
Landis, Stefan
Nano lithography
title Nano lithography
title_full Nano lithography
title_fullStr Nano lithography
title_full_unstemmed Nano lithography
title_short Nano lithography
title_sort nano lithography
topic Engineering
url http://cds.cern.ch/record/1617140
work_keys_str_mv AT landisstefan nanolithography