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Laser processing of thin films and microstructures: oxidation, deposition and etching of insulators

Detalles Bibliográficos
Autor principal: Boyd, Ian W
Lenguaje:eng
Publicado: Springer 1987
Materias:
Acceso en línea:https://dx.doi.org/10.1007/978-3-642-83136-2
http://cds.cern.ch/record/1624635
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author Boyd, Ian W
author_facet Boyd, Ian W
author_sort Boyd, Ian W
collection CERN
id cern-1624635
institution Organización Europea para la Investigación Nuclear
language eng
publishDate 1987
publisher Springer
record_format invenio
spelling cern-16246352021-04-21T21:45:16Zdoi:10.1007/978-3-642-83136-2http://cds.cern.ch/record/1624635engBoyd, Ian WLaser processing of thin films and microstructures: oxidation, deposition and etching of insulatorsEngineeringSpringeroai:cds.cern.ch:16246351987
spellingShingle Engineering
Boyd, Ian W
Laser processing of thin films and microstructures: oxidation, deposition and etching of insulators
title Laser processing of thin films and microstructures: oxidation, deposition and etching of insulators
title_full Laser processing of thin films and microstructures: oxidation, deposition and etching of insulators
title_fullStr Laser processing of thin films and microstructures: oxidation, deposition and etching of insulators
title_full_unstemmed Laser processing of thin films and microstructures: oxidation, deposition and etching of insulators
title_short Laser processing of thin films and microstructures: oxidation, deposition and etching of insulators
title_sort laser processing of thin films and microstructures: oxidation, deposition and etching of insulators
topic Engineering
url https://dx.doi.org/10.1007/978-3-642-83136-2
http://cds.cern.ch/record/1624635
work_keys_str_mv AT boydianw laserprocessingofthinfilmsandmicrostructuresoxidationdepositionandetchingofinsulators