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Plasma technology: fundamentals and applications

Detalles Bibliográficos
Autores principales:	Capitelli, Mario, Gorse, Claudine
Lenguaje:	eng
Publicado:	Springer 1992
Materias:	General Theoretical Physics
Acceso en línea:	https://dx.doi.org/10.1007/978-1-4615-3400-6 http://cds.cern.ch/record/1626356

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