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Dry etching for VLSI
| Autores principales: | , , |
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| Lenguaje: | eng |
| Publicado: |
Springer
1991
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| Materias: | |
| Acceso en línea: | https://dx.doi.org/10.1007/978-1-4899-2566-4 http://cds.cern.ch/record/1627996 |
| _version_ | 1780933944598855680 |
|---|---|
| author | Roosmalen, A J Baggerman, J A G Brader, S J H |
| author_facet | Roosmalen, A J Baggerman, J A G Brader, S J H |
| author_sort | Roosmalen, A J |
| collection | CERN |
| id | cern-1627996 |
| institution | Organización Europea para la Investigación Nuclear |
| language | eng |
| publishDate | 1991 |
| publisher | Springer |
| record_format | invenio |
| spelling | cern-16279962021-04-21T21:36:54Zdoi:10.1007/978-1-4899-2566-4http://cds.cern.ch/record/1627996engRoosmalen, A JBaggerman, J A GBrader, S J HDry etching for VLSIParticle Physics – TheorySpringeroai:cds.cern.ch:16279961991 |
| spellingShingle | Particle Physics – Theory Roosmalen, A J Baggerman, J A G Brader, S J H Dry etching for VLSI |
| title | Dry etching for VLSI |
| title_full | Dry etching for VLSI |
| title_fullStr | Dry etching for VLSI |
| title_full_unstemmed | Dry etching for VLSI |
| title_short | Dry etching for VLSI |
| title_sort | dry etching for vlsi |
| topic | Particle Physics – Theory |
| url | https://dx.doi.org/10.1007/978-1-4899-2566-4 http://cds.cern.ch/record/1627996 |
| work_keys_str_mv | AT roosmalenaj dryetchingforvlsi AT baggermanjag dryetchingforvlsi AT bradersjh dryetchingforvlsi |