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Dry etching for VLSI

Detalles Bibliográficos
Autores principales:	Roosmalen, A J, Baggerman, J A G, Brader, S J H
Lenguaje:	eng
Publicado:	Springer 1991
Materias:	Particle Physics – Theory
Acceso en línea:	https://dx.doi.org/10.1007/978-1-4899-2566-4 http://cds.cern.ch/record/1627996

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