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Ion implantation of Cd and Ag into AlN and GaN
GaN and AlN thin films were implanted with cadmium (Cd) or silver (Ag), to fluences ranging from 1×1013 to 1.7 × 1015 at/cm$^{2}$. The implanted samples were annealed at 950 ºC under flowing nitrogen. While implantation damage could be fully removed for the lowest fluences, for higher fluences the c...
Autores principales: | Miranda, Sérgio M C, Kessler, Patrick, Correia, João Guilherme, Vianden, Reiner, Johnston, Karl, Alves, Eduardo, Lorenz, Katharina |
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Lenguaje: | eng |
Publicado: |
2012
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Materias: | |
Acceso en línea: | https://dx.doi.org/10.1002/pssc.201100203 http://cds.cern.ch/record/1641252 |
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