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Modeling of chemical vapor deposition of tungsten films
Autores principales: | , |
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Lenguaje: | eng |
Publicado: |
Springer
1993
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Materias: | |
Acceso en línea: | https://dx.doi.org/10.1007/978-3-0348-7741-1 http://cds.cern.ch/record/1667145 |
_version_ | 1780935443987038208 |
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author | Kleijn, Chris R Werner, Christoph |
author_facet | Kleijn, Chris R Werner, Christoph |
author_sort | Kleijn, Chris R |
collection | CERN |
id | cern-1667145 |
institution | Organización Europea para la Investigación Nuclear |
language | eng |
publishDate | 1993 |
publisher | Springer |
record_format | invenio |
spelling | cern-16671452021-04-21T21:15:19Zdoi:10.1007/978-3-0348-7741-1http://cds.cern.ch/record/1667145engKleijn, Chris RWerner, ChristophModeling of chemical vapor deposition of tungsten filmsMathematical Physics and MathematicsSpringeroai:cds.cern.ch:16671451993 |
spellingShingle | Mathematical Physics and Mathematics Kleijn, Chris R Werner, Christoph Modeling of chemical vapor deposition of tungsten films |
title | Modeling of chemical vapor deposition of tungsten films |
title_full | Modeling of chemical vapor deposition of tungsten films |
title_fullStr | Modeling of chemical vapor deposition of tungsten films |
title_full_unstemmed | Modeling of chemical vapor deposition of tungsten films |
title_short | Modeling of chemical vapor deposition of tungsten films |
title_sort | modeling of chemical vapor deposition of tungsten films |
topic | Mathematical Physics and Mathematics |
url | https://dx.doi.org/10.1007/978-3-0348-7741-1 http://cds.cern.ch/record/1667145 |
work_keys_str_mv | AT kleijnchrisr modelingofchemicalvapordepositionoftungstenfilms AT wernerchristoph modelingofchemicalvapordepositionoftungstenfilms |