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Modeling of chemical vapor deposition of tungsten films

Detalles Bibliográficos
Autores principales: Kleijn, Chris R, Werner, Christoph
Lenguaje:eng
Publicado: Springer 1993
Materias:
Acceso en línea:https://dx.doi.org/10.1007/978-3-0348-7741-1
http://cds.cern.ch/record/1667145
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author Kleijn, Chris R
Werner, Christoph
author_facet Kleijn, Chris R
Werner, Christoph
author_sort Kleijn, Chris R
collection CERN
id cern-1667145
institution Organización Europea para la Investigación Nuclear
language eng
publishDate 1993
publisher Springer
record_format invenio
spelling cern-16671452021-04-21T21:15:19Zdoi:10.1007/978-3-0348-7741-1http://cds.cern.ch/record/1667145engKleijn, Chris RWerner, ChristophModeling of chemical vapor deposition of tungsten filmsMathematical Physics and MathematicsSpringeroai:cds.cern.ch:16671451993
spellingShingle Mathematical Physics and Mathematics
Kleijn, Chris R
Werner, Christoph
Modeling of chemical vapor deposition of tungsten films
title Modeling of chemical vapor deposition of tungsten films
title_full Modeling of chemical vapor deposition of tungsten films
title_fullStr Modeling of chemical vapor deposition of tungsten films
title_full_unstemmed Modeling of chemical vapor deposition of tungsten films
title_short Modeling of chemical vapor deposition of tungsten films
title_sort modeling of chemical vapor deposition of tungsten films
topic Mathematical Physics and Mathematics
url https://dx.doi.org/10.1007/978-3-0348-7741-1
http://cds.cern.ch/record/1667145
work_keys_str_mv AT kleijnchrisr modelingofchemicalvapordepositionoftungstenfilms
AT wernerchristoph modelingofchemicalvapordepositionoftungstenfilms