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Modeling of chemical vapor deposition of tungsten films

Detalles Bibliográficos
Autores principales:	Kleijn, Chris R, Werner, Christoph
Lenguaje:	eng
Publicado:	Springer 1993
Materias:	Mathematical Physics and Mathematics
Acceso en línea:	https://dx.doi.org/10.1007/978-3-0348-7741-1 http://cds.cern.ch/record/1667145

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