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Through Silicon Via Redistribution of I/O Pads

An 80x80 pixel ASIC for connection to CdTe detectors for spectroscopic X-ray imaging has been designed at the Rutherford Appleton Laboratory. The 20mm x 21.4mm ASIC is intrinsically 3-side butt-able when bump bonded to a 20mm x 20mm detector. The 4th edge has readout structures and the input/output...

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Detalles Bibliográficos
Autores principales: Seller, P, Bell, S, Wilson, M D, Veale, M C
Formato: info:eu-repo/semantics/article
Lenguaje:eng
Publicado: 2012
Materias:
Acceso en línea:http://cds.cern.ch/record/1693481
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author Seller, P
Bell, S
Wilson, M D
Veale, M C
author_facet Seller, P
Bell, S
Wilson, M D
Veale, M C
author_sort Seller, P
collection CERN
description An 80x80 pixel ASIC for connection to CdTe detectors for spectroscopic X-ray imaging has been designed at the Rutherford Appleton Laboratory. The 20mm x 21.4mm ASIC is intrinsically 3-side butt-able when bump bonded to a 20mm x 20mm detector. The 4th edge has readout structures and the input/output (110) pads for wire bonding. This necessitates 3mm of inactive space between detectors on this edge when the detectors are tiled together. To reduce this lost space we have redistributed the 110 pads through the ASIC silicon substrate to the back of the ASIC and wire bonded on the back of the module. This wafer level technology step performed by Tohoku-MicroTec Co. Ltd. allows much greater area coverage for modular solid state detectors. The paper describes the process and results from first 8inch wafers of devices
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spelling cern-16934812019-09-30T06:29:59Z http://cds.cern.ch/record/1693481 eng Seller, P Bell, S Wilson, M D Veale, M C Through Silicon Via Redistribution of I/O Pads Detectors and Experimental Techniques 3: Microelectronics and interconnection technology 3.2: 3D Interconnection An 80x80 pixel ASIC for connection to CdTe detectors for spectroscopic X-ray imaging has been designed at the Rutherford Appleton Laboratory. The 20mm x 21.4mm ASIC is intrinsically 3-side butt-able when bump bonded to a 20mm x 20mm detector. The 4th edge has readout structures and the input/output (110) pads for wire bonding. This necessitates 3mm of inactive space between detectors on this edge when the detectors are tiled together. To reduce this lost space we have redistributed the 110 pads through the ASIC silicon substrate to the back of the ASIC and wire bonded on the back of the module. This wafer level technology step performed by Tohoku-MicroTec Co. Ltd. allows much greater area coverage for modular solid state detectors. The paper describes the process and results from first 8inch wafers of devices info:eu-repo/grantAgreement/EC/FP7/262025 info:eu-repo/semantics/openAccess Education Level info:eu-repo/semantics/article http://cds.cern.ch/record/1693481 2012
spellingShingle Detectors and Experimental Techniques
3: Microelectronics and interconnection technology
3.2: 3D Interconnection
Seller, P
Bell, S
Wilson, M D
Veale, M C
Through Silicon Via Redistribution of I/O Pads
title Through Silicon Via Redistribution of I/O Pads
title_full Through Silicon Via Redistribution of I/O Pads
title_fullStr Through Silicon Via Redistribution of I/O Pads
title_full_unstemmed Through Silicon Via Redistribution of I/O Pads
title_short Through Silicon Via Redistribution of I/O Pads
title_sort through silicon via redistribution of i/o pads
topic Detectors and Experimental Techniques
3: Microelectronics and interconnection technology
3.2: 3D Interconnection
url http://cds.cern.ch/record/1693481
http://cds.cern.ch/record/1693481
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