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CMOS sensors in 90 nm fabricated on high resistivity wafers: Design concept and irradiation results

The LePix project aims at improving the radiation hardness and the readout speed of monolithic CMOS sensors through the use of standard CMOS technologies fabricated on high resistivity substrates. In this context, high resistivity means beyond 400 Omega cm, which is at least one order of magnitude g...

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Detalles Bibliográficos
Autores principales: Rivetti, A, Caselle, M, Wyss, J, Bisello, D, Costa, M, Kloukinas, K, Demaria, N, Pantano, D, Rousset, J, Battaglia, M, Mansuy, C, Potenza, A, Ikemoto, Y, Giubilato, P, Chalmet, P, Mugnier, H, Silvestrin, L, Marchioro, A
Lenguaje:eng
Publicado: 2013
Materias:
Acceso en línea:https://dx.doi.org/10.1016/j.nima.2013.06.068
http://cds.cern.ch/record/1711839

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