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Organometallic vapor-phase epitaxy: theory and practice

Here is one of the first single-author treatments of organometallic vapor-phase epitaxy (OMVPE)--a leading technique for the fabrication of semiconductor materials and devices. Also included are metal-organic molecular-beam epitaxy (MOMBE) and chemical-beam epitaxy (CBE) ultra-high-vacuum deposition...

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Detalles Bibliográficos
Autor principal: Stringfellow, Gerald B
Lenguaje:eng
Publicado: Academic Press 1989
Materias:
Acceso en línea:http://cds.cern.ch/record/1985514
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author Stringfellow, Gerald B
author_facet Stringfellow, Gerald B
author_sort Stringfellow, Gerald B
collection CERN
description Here is one of the first single-author treatments of organometallic vapor-phase epitaxy (OMVPE)--a leading technique for the fabrication of semiconductor materials and devices. Also included are metal-organic molecular-beam epitaxy (MOMBE) and chemical-beam epitaxy (CBE) ultra-high-vacuum deposition techniques using organometallic source molecules. Of interest to researchers, students, and people in the semiconductor industry, this book provides a basic foundation for understanding the technique and the application of OMVPE for the growth of both III-V and II-VI semiconductor materials and the
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institution Organización Europea para la Investigación Nuclear
language eng
publishDate 1989
publisher Academic Press
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spelling cern-19855142021-04-21T20:37:25Zhttp://cds.cern.ch/record/1985514engStringfellow, Gerald BOrganometallic vapor-phase epitaxy: theory and practiceOther Fields of PhysicsHere is one of the first single-author treatments of organometallic vapor-phase epitaxy (OMVPE)--a leading technique for the fabrication of semiconductor materials and devices. Also included are metal-organic molecular-beam epitaxy (MOMBE) and chemical-beam epitaxy (CBE) ultra-high-vacuum deposition techniques using organometallic source molecules. Of interest to researchers, students, and people in the semiconductor industry, this book provides a basic foundation for understanding the technique and the application of OMVPE for the growth of both III-V and II-VI semiconductor materials and theAcademic Pressoai:cds.cern.ch:19855141989
spellingShingle Other Fields of Physics
Stringfellow, Gerald B
Organometallic vapor-phase epitaxy: theory and practice
title Organometallic vapor-phase epitaxy: theory and practice
title_full Organometallic vapor-phase epitaxy: theory and practice
title_fullStr Organometallic vapor-phase epitaxy: theory and practice
title_full_unstemmed Organometallic vapor-phase epitaxy: theory and practice
title_short Organometallic vapor-phase epitaxy: theory and practice
title_sort organometallic vapor-phase epitaxy: theory and practice
topic Other Fields of Physics
url http://cds.cern.ch/record/1985514
work_keys_str_mv AT stringfellowgeraldb organometallicvaporphaseepitaxytheoryandpractice