Cargando…
Poly-SiGe for MEMS-above-CMOS sensors
Polycrystalline SiGe has emerged as a promising MEMS (Microelectromechanical Systems) structural material since it provides the desired mechanical properties at lower temperatures compared to poly-Si, allowing the direct post-processing on top of CMOS. This CMOS-MEMS monolithic integration can lead...
Autores principales: | Gonzalez Ruiz, Pilar, De Meyer, Kristin, Witvrouw, Ann |
---|---|
Lenguaje: | eng |
Publicado: |
Springer
2014
|
Materias: | |
Acceso en línea: | https://dx.doi.org/10.1007/978-94-007-6799-7 http://cds.cern.ch/record/2023510 |
Ejemplares similares
-
Reliability of high mobility SiGe channel MOSFETs for future CMOS applications
por: Franco, Jacopo, et al.
Publicado: (2014) -
SiGe-based re-engineering of electronic warfare subsystems
por: Lambrechts, Wynand, et al.
Publicado: (2017) -
SiGe, GaAs, and InP heterojunction bipolar transistors
por: Yuan, J S
Publicado: (1999) -
Technology computer aided design for Si, SiGe and GaAs integrated circuits
por: Armstrong, GA, et al.
Publicado: (2007) -
High-Performance P- and N-Type SiGe/Si Strained Super-Lattice FinFET and CMOS Inverter: Comparison of Si and SiGe FinFET
por: Yao, Yi-Ju, et al.
Publicado: (2023)