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Inclusive $\overline{K}^{*0}$(892) and K$^{*0}$(892) production on silicon by 200 GeV K$^{-}$ and $\pi^{-}$
Autores principales: | , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , , |
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Lenguaje: | eng |
Publicado: |
1990
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Materias: | |
Acceso en línea: | https://dx.doi.org/10.1007/BF01560251 http://cds.cern.ch/record/210349 |
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por Fawcett, H, Barlag, S, Becker, H, Belau, E, Böhringer, T, Bosman, M, Castillo, V, Chabaud, V, Buchholz, D A, Damerell, C, Daum, C, de Rijk, G, Dietl, H, Gill, S, Gillman, A R, Gilmore, R, Gooch, T G, Gras, P, Hajduk, Z, Higón, E, Hyams, Bernard David, Kelsey, D P, Kemmer, J, Klanner, Robert, Kötz, U, Kwan, S, Lücking, B, Lütjens, G, Lutz, Gerhard, Malos, J, Männer, W, Neugebauer, E, Palka, H, Pepé, M, Polok, G, Richardson, J, Rózanska, M, Rybicki, K, Seebrunner, H J, Stierlin, U, Tapper, R J, Tiecke, H G, Turala, Michal, Waltermann, G, Watts, S, Weilhammer, Peter, Wickens, F J, Wiggers, L, Wylie, A, Zeludziewicz, T
Publicado 1990
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Publicado 1990