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Thin films for emerging applications
Following in the long-standing tradition of excellence established by this serial, this volume provides a focused look at contemporary applications. High Tc superconducting thin films are discussed in terms of ion beam and sputtering deposition, vacuum evaporation, laser ablation, MOCVD, and other d...
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Lenguaje: | eng |
Publicado: |
Academic Press
1992
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Acceso en línea: | http://cds.cern.ch/record/2121408 |
_version_ | 1780949366057467904 |
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author | Francombe, Maurice H Vossen, John L |
author_facet | Francombe, Maurice H Vossen, John L |
author_sort | Francombe, Maurice H |
collection | CERN |
description | Following in the long-standing tradition of excellence established by this serial, this volume provides a focused look at contemporary applications. High Tc superconducting thin films are discussed in terms of ion beam and sputtering deposition, vacuum evaporation, laser ablation, MOCVD, and other deposition processes in addition to their ultimate applications. Detailed treatment is also given to permanent magnet thin films, lateral diffusion and electromigration in metallic thin films, and fracture and cracking phenomena in thin films adhering to high-elongation substrates. |
id | cern-2121408 |
institution | Organización Europea para la Investigación Nuclear |
language | eng |
publishDate | 1992 |
publisher | Academic Press |
record_format | invenio |
spelling | cern-21214082021-04-21T19:55:25Zhttp://cds.cern.ch/record/2121408engFrancombe, Maurice HVossen, John LThin films for emerging applicationsGeneral Theoretical PhysicsFollowing in the long-standing tradition of excellence established by this serial, this volume provides a focused look at contemporary applications. High Tc superconducting thin films are discussed in terms of ion beam and sputtering deposition, vacuum evaporation, laser ablation, MOCVD, and other deposition processes in addition to their ultimate applications. Detailed treatment is also given to permanent magnet thin films, lateral diffusion and electromigration in metallic thin films, and fracture and cracking phenomena in thin films adhering to high-elongation substrates.Academic Pressoai:cds.cern.ch:21214081992 |
spellingShingle | General Theoretical Physics Francombe, Maurice H Vossen, John L Thin films for emerging applications |
title | Thin films for emerging applications |
title_full | Thin films for emerging applications |
title_fullStr | Thin films for emerging applications |
title_full_unstemmed | Thin films for emerging applications |
title_short | Thin films for emerging applications |
title_sort | thin films for emerging applications |
topic | General Theoretical Physics |
url | http://cds.cern.ch/record/2121408 |
work_keys_str_mv | AT francombemauriceh thinfilmsforemergingapplications AT vossenjohnl thinfilmsforemergingapplications |