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Thick film technology: fundamentals and applications in microelectronics
Autor principal: | |
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Lenguaje: | eng |
Publicado: |
Hayden
1973
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Materias: | |
Acceso en línea: | http://cds.cern.ch/record/222825 |
_version_ | 1780883356180807680 |
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author | Agnew, Jeremy |
author_facet | Agnew, Jeremy |
author_sort | Agnew, Jeremy |
collection | CERN |
id | cern-222825 |
institution | Organización Europea para la Investigación Nuclear |
language | eng |
publishDate | 1973 |
publisher | Hayden |
record_format | invenio |
spelling | cern-2228252021-04-22T04:31:11Zhttp://cds.cern.ch/record/222825engAgnew, JeremyThick film technology: fundamentals and applications in microelectronicsEngineeringHaydenoai:cds.cern.ch:2228251973 |
spellingShingle | Engineering Agnew, Jeremy Thick film technology: fundamentals and applications in microelectronics |
title | Thick film technology: fundamentals and applications in microelectronics |
title_full | Thick film technology: fundamentals and applications in microelectronics |
title_fullStr | Thick film technology: fundamentals and applications in microelectronics |
title_full_unstemmed | Thick film technology: fundamentals and applications in microelectronics |
title_short | Thick film technology: fundamentals and applications in microelectronics |
title_sort | thick film technology: fundamentals and applications in microelectronics |
topic | Engineering |
url | http://cds.cern.ch/record/222825 |
work_keys_str_mv | AT agnewjeremy thickfilmtechnologyfundamentalsandapplicationsinmicroelectronics |