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Materials and processes for next generation lithography
| Autores principales: | , |
|---|---|
| Lenguaje: | eng |
| Publicado: |
Elsevier Science
2016
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| Materias: | |
| Acceso en línea: | http://cds.cern.ch/record/2238039 |
| _version_ | 1780952894141366272 |
|---|---|
| author | Robinson, Alex Lawson, Richard |
| author_facet | Robinson, Alex Lawson, Richard |
| author_sort | Robinson, Alex |
| collection | CERN |
| id | cern-2238039 |
| institution | Organización Europea para la Investigación Nuclear |
| language | eng |
| publishDate | 2016 |
| publisher | Elsevier Science |
| record_format | invenio |
| spelling | cern-22380392021-04-21T19:25:23Zhttp://cds.cern.ch/record/2238039engRobinson, AlexLawson, RichardMaterials and processes for next generation lithographyEngineeringElsevier Scienceoai:cds.cern.ch:22380392016 |
| spellingShingle | Engineering Robinson, Alex Lawson, Richard Materials and processes for next generation lithography |
| title | Materials and processes for next generation lithography |
| title_full | Materials and processes for next generation lithography |
| title_fullStr | Materials and processes for next generation lithography |
| title_full_unstemmed | Materials and processes for next generation lithography |
| title_short | Materials and processes for next generation lithography |
| title_sort | materials and processes for next generation lithography |
| topic | Engineering |
| url | http://cds.cern.ch/record/2238039 |
| work_keys_str_mv | AT robinsonalex materialsandprocessesfornextgenerationlithography AT lawsonrichard materialsandprocessesfornextgenerationlithography |