Cargando…
Diazonaphthoquinone-based resists
Autor principal: | |
---|---|
Lenguaje: | eng |
Publicado: |
Society of Photo-Optical Instrumentation Engineers (SPIE)
1993
|
Materias: | |
Acceso en línea: | http://cds.cern.ch/record/2283907 |
_version_ | 1780955795770310656 |
---|---|
author | Dammel, Ralph R |
author_facet | Dammel, Ralph R |
author_sort | Dammel, Ralph R |
collection | CERN |
id | cern-2283907 |
institution | Organización Europea para la Investigación Nuclear |
language | eng |
publishDate | 1993 |
publisher | Society of Photo-Optical Instrumentation Engineers (SPIE) |
record_format | invenio |
spelling | cern-22839072021-04-21T19:03:23Zhttp://cds.cern.ch/record/2283907engDammel, Ralph RDiazonaphthoquinone-based resistsXXSociety of Photo-Optical Instrumentation Engineers (SPIE)oai:cds.cern.ch:22839071993 |
spellingShingle | XX Dammel, Ralph R Diazonaphthoquinone-based resists |
title | Diazonaphthoquinone-based resists |
title_full | Diazonaphthoquinone-based resists |
title_fullStr | Diazonaphthoquinone-based resists |
title_full_unstemmed | Diazonaphthoquinone-based resists |
title_short | Diazonaphthoquinone-based resists |
title_sort | diazonaphthoquinone-based resists |
topic | XX |
url | http://cds.cern.ch/record/2283907 |
work_keys_str_mv | AT dammelralphr diazonaphthoquinonebasedresists |