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Molecular theory of lithography
Autor principal: | |
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Lenguaje: | eng |
Publicado: |
Society of Photo-Optical Instrumentation Engineers
2015
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Materias: | |
Acceso en línea: | http://cds.cern.ch/record/2288892 |
_version_ | 1780956222399184896 |
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author | Okoroanyanwu, Uzodinma |
author_facet | Okoroanyanwu, Uzodinma |
author_sort | Okoroanyanwu, Uzodinma |
collection | CERN |
id | cern-2288892 |
institution | Organización Europea para la Investigación Nuclear |
language | eng |
publishDate | 2015 |
publisher | Society of Photo-Optical Instrumentation Engineers |
record_format | invenio |
spelling | cern-22888922021-04-21T19:02:06Zhttp://cds.cern.ch/record/2288892engOkoroanyanwu, UzodinmaMolecular theory of lithographyEngineeringSociety of Photo-Optical Instrumentation Engineersoai:cds.cern.ch:22888922015 |
spellingShingle | Engineering Okoroanyanwu, Uzodinma Molecular theory of lithography |
title | Molecular theory of lithography |
title_full | Molecular theory of lithography |
title_fullStr | Molecular theory of lithography |
title_full_unstemmed | Molecular theory of lithography |
title_short | Molecular theory of lithography |
title_sort | molecular theory of lithography |
topic | Engineering |
url | http://cds.cern.ch/record/2288892 |
work_keys_str_mv | AT okoroanyanwuuzodinma moleculartheoryoflithography |