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Diffusion of tellurium in silicon studied by the redistribution of an implanted source of radioactive 121Te.Si: Te
| Autores principales: | , , |
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| Lenguaje: | eng |
| Publicado: |
1993
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| Materias: | |
| Acceso en línea: | https://dx.doi.org/10.1016/0921-5107(93)90121-3 http://cds.cern.ch/record/259994 |