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Diffusion of tellurium in silicon studied by the redistribution of an implanted source of radioactive 121Te.Si: Te

Detalles Bibliográficos
Autores principales:	Rollert, R, Stolwijk, N A, Mehrer, H
Lenguaje:	eng
Publicado:	1993
Materias:	Other Fields of Physics
Acceso en línea:	https://dx.doi.org/10.1016/0921-5107(93)90121-3 http://cds.cern.ch/record/259994

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