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Comparison of 35 and 50 ${\mu}$m thin HPK UFSD after neutron irradiation up to $6•10^15$ $neq/cm^2$

We report results from the testing of 35 μ m thick Ultra-Fast Silicon Detectors (UFSD) produced by Hamamatsu Photonics (HPK), Japan and the comparison of these new results to data reported in a previous paper on 50 μ m thick UFSD produced by HPK. The 35 μ m thick sensors were irradiated with neutron...

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Detalles Bibliográficos
Autores principales: Zhao, Y., Cartiglia, N., Estrada, E., Galloway, Z., Gee, C., Goto, A., Luce, Z., Mazza, S.M., Mckinney-Martinez, F., Rodriguez, R., Sadrozinski, H.F.-W., Seiden, A., Cindro, V., Kramberger, G., Mandić, I., Mikuž, M., Zavrtanik, M.
Formato: info:eu-repo/semantics/article
Lenguaje:eng
Publicado: Nucl. Instrum. Methods Phys. Res., A 2018
Materias:
Acceso en línea:https://dx.doi.org/10.1016/j.nima.2018.08.040
http://cds.cern.ch/record/2633859
Descripción
Sumario:We report results from the testing of 35 μ m thick Ultra-Fast Silicon Detectors (UFSD) produced by Hamamatsu Photonics (HPK), Japan and the comparison of these new results to data reported in a previous paper on 50 μ m thick UFSD produced by HPK. The 35 μ m thick sensors were irradiated with neutrons to fluences of 1  ⋅  10 14 , 1  ⋅  10 15 , 3  ⋅  10 15 , 6  ⋅  10 15 neq/cm 2 . The sensors were tested pre-irradiation and post-irradiation with minimum ionizing particles (MIPs) from a 90 Sr β -source. The leakage current, capacitance, internal gain and the timing resolution were measured as a function of bias voltage at −20 °C and −27 °C. The timing resolution was extracted from the time difference with a second calibrated UFSD in coincidence, using the constant fraction discrimination method for both devices. Within the fluence range measured, 35 μ m thick UFSD present advantages in timing accuracy, bias voltage and power consumption.