Cargando…
$^{119}$Sn Mössbauer study of the implantation behaviour of $^{119}$In, $^{119}$Sn, $^{119m}$Sn, $^{119}$Sb and $^{119m}$Te ions in SiC
| Autores principales: | , , , , , |
|---|---|
| Lenguaje: | eng |
| Publicado: |
1985
|
| Materias: | |
| Acceso en línea: | https://dx.doi.org/10.1007/BF02060136 http://cds.cern.ch/record/264894 |