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RF amplifier using VRF151G and BLF 574 power RF mosfets

Two identical setups, each bearing one RF Mosfet type (VRF151 and BLF574) have been used. The equipment installed in the radiation zone consist of a RF Power amplifier, an RF load, cooling fans and a radiation compensation reference device. The reference device is the same as used for the RF Power a...

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Autores principales: Ohmori, Chihiro, Paoluzzi, Mauro
Lenguaje:eng
Publicado: 2019
Acceso en línea:http://cds.cern.ch/record/2667253
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author Ohmori, Chihiro
Paoluzzi, Mauro
author_facet Ohmori, Chihiro
Paoluzzi, Mauro
author_sort Ohmori, Chihiro
collection CERN
description Two identical setups, each bearing one RF Mosfet type (VRF151 and BLF574) have been used. The equipment installed in the radiation zone consist of a RF Power amplifier, an RF load, cooling fans and a radiation compensation reference device. The reference device is the same as used for the RF Power amplifier. The irradiated setups, installed in the equipment room, provide adequate RF driving for constant amplitude operation (100W) and frequency sweep from 0.5 MHz to 5 MHz. Compensation for the TID effects on the threshold voltage displacement is derived from the reference device response and applied to the RF Power Amplifier device. The study aimed at evaluating the compensation effectiveness and the degradation of the amplifier characteristics in terms of maximum power, gain and phase variations. During the session, the configuration of CHARM was copper target no shielding hereafter defined as “CuOOOO”.
id cern-2667253
institution Organización Europea para la Investigación Nuclear
language eng
publishDate 2019
record_format invenio
spelling cern-26672532019-11-04T14:57:41Zhttp://cds.cern.ch/record/2667253engOhmori, ChihiroPaoluzzi, MauroRF amplifier using VRF151G and BLF 574 power RF mosfetsTwo identical setups, each bearing one RF Mosfet type (VRF151 and BLF574) have been used. The equipment installed in the radiation zone consist of a RF Power amplifier, an RF load, cooling fans and a radiation compensation reference device. The reference device is the same as used for the RF Power amplifier. The irradiated setups, installed in the equipment room, provide adequate RF driving for constant amplitude operation (100W) and frequency sweep from 0.5 MHz to 5 MHz. Compensation for the TID effects on the threshold voltage displacement is derived from the reference device response and applied to the RF Power Amplifier device. The study aimed at evaluating the compensation effectiveness and the degradation of the amplifier characteristics in terms of maximum power, gain and phase variations. During the session, the configuration of CHARM was copper target no shielding hereafter defined as “CuOOOO”.oai:cds.cern.ch:26672532019
spellingShingle Ohmori, Chihiro
Paoluzzi, Mauro
RF amplifier using VRF151G and BLF 574 power RF mosfets
title RF amplifier using VRF151G and BLF 574 power RF mosfets
title_full RF amplifier using VRF151G and BLF 574 power RF mosfets
title_fullStr RF amplifier using VRF151G and BLF 574 power RF mosfets
title_full_unstemmed RF amplifier using VRF151G and BLF 574 power RF mosfets
title_short RF amplifier using VRF151G and BLF 574 power RF mosfets
title_sort rf amplifier using vrf151g and blf 574 power rf mosfets
url http://cds.cern.ch/record/2667253
work_keys_str_mv AT ohmorichihiro rfamplifierusingvrf151gandblf574powerrfmosfets
AT paoluzzimauro rfamplifierusingvrf151gandblf574powerrfmosfets