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Ferroelectricity in doped hafnium oxide: materials properties and devices
Autores principales: | Schroeder, Uwe, Hwang, Cheol Seong, Funakubo, Hiroshi |
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Lenguaje: | eng |
Publicado: |
Elsevier Science & Technology
2019
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Materias: | |
Acceso en línea: | http://cds.cern.ch/record/2675600 |
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