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Long-term reliability of nanometer VLSI systems: modeling, analysis and optimization
This book provides readers with a detailed reference regarding two of the most important long-term reliability and aging effects on nanometer integrated systems, electromigrations (EM) for interconnect and biased temperature instability (BTI) for CMOS devices. The authors discuss in detail recent de...
| Autores principales: | , , , , , |
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| Lenguaje: | eng |
| Publicado: |
Springer
2019
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| Materias: | |
| Acceso en línea: | https://dx.doi.org/10.1007/978-3-030-26172-6 http://cds.cern.ch/record/2691360 |