Implementation and Characterisation of Monolithic CMOS Pixel Sensors for the CLIC Vertex and Tracking Detectors

Different CMOS technologies are being considered for the vertex and tracking layers of the detector at the proposed high-energy e$^{+}$e$^{−}$ Compact Linear Collider (CLIC). CMOS processes have been proven to be suitable for building high granularity, large area detector systems with low material budget and low power consumption. An effort is put on implementing detectors capable of performing precise timing measurements. Two Application-Specific Integrated Circuits (ASICs) for particle detection have been developed in the framework of this thesis, following the specifications of the CLIC vertex and tracking detectors. The process choice was based on a study of the features of each of the different available technologies and an evaluation of their suitability for each application. The CLICpix Capacitively Coupled Pixel Detector (C3PD) is a pixelated detector chip designed to be used in capacitively coupled assemblies with the CLICpix2 readout chip, in the framework of the vertex detector at CLIC. The chip comprises a matrix of 128×128 square pixels with 25 µm pitch. A commercial 180 nm High-Voltage (HV) CMOS process was used for the C3PD design. The charge is collected with a large deep N-well, while each pixel includes a preamplifier placed on top of the collecting electrode. The C3PD chip was produced on wafers with different values for the substrate resistivity (∼ 20, 80, 200 and 1000 Ωcm) and has been extensively tested through laboratory measurements and beam tests. The design details and characterisation results of the C3PD chip will be presented. The CLIC Tracker Detector (CLICTD) is a novel monolithic detector chip developed in the context of the silicon tracker at CLIC. The CLICTD chip combines high density, mixed mode circuits on the same substrate, while it performs a fast time-tagging measurement with 10 ns time bins. The chip is produced in a 180 nm CMOS imaging process with a High-Resistivity (HR) epitaxial layer. A matrix of 16×128 detecting cells, each measuring 300 × 30 µm$^{2}$ , is included. A small N-well is used to collect the charge generated in the sensor volume, while an additional deep N-type implant is used to fully deplete the epitaxial layer. Using a process split, additional wafers are produced with a segmented deep N-type implant, a modification that has been simulated to result in a faster charge collection time. Each detecting cell is segmented into eight front-ends to ensure prompt charge collection in the sensor diodes. A simultaneous 8-bit timing and 5-bit energy measurement is performed in each detecting cell. A detailed description of the CLICTD design will be given, followed by the first measurement results.