Cargando…
Fabrication of porous gallium nitride by photoelectrochemical etching method
Autores principales: | , |
---|---|
Lenguaje: | eng |
Publicado: |
Penerbit USM
2017
|
Materias: | |
Acceso en línea: | http://cds.cern.ch/record/2713766 |
_version_ | 1780965340830760960 |
---|---|
author | Cheah, Sook Fong Ng, Sha Shiong |
author_facet | Cheah, Sook Fong Ng, Sha Shiong |
author_sort | Cheah, Sook Fong |
collection | CERN |
id | cern-2713766 |
institution | Organización Europea para la Investigación Nuclear |
language | eng |
publishDate | 2017 |
publisher | Penerbit USM |
record_format | invenio |
spelling | cern-27137662021-04-21T18:09:20Zhttp://cds.cern.ch/record/2713766engCheah, Sook FongNg, Sha ShiongFabrication of porous gallium nitride by photoelectrochemical etching methodEngineeringPenerbit USMoai:cds.cern.ch:27137662017 |
spellingShingle | Engineering Cheah, Sook Fong Ng, Sha Shiong Fabrication of porous gallium nitride by photoelectrochemical etching method |
title | Fabrication of porous gallium nitride by photoelectrochemical etching method |
title_full | Fabrication of porous gallium nitride by photoelectrochemical etching method |
title_fullStr | Fabrication of porous gallium nitride by photoelectrochemical etching method |
title_full_unstemmed | Fabrication of porous gallium nitride by photoelectrochemical etching method |
title_short | Fabrication of porous gallium nitride by photoelectrochemical etching method |
title_sort | fabrication of porous gallium nitride by photoelectrochemical etching method |
topic | Engineering |
url | http://cds.cern.ch/record/2713766 |
work_keys_str_mv | AT cheahsookfong fabricationofporousgalliumnitridebyphotoelectrochemicaletchingmethod AT ngshashiong fabricationofporousgalliumnitridebyphotoelectrochemicaletchingmethod |