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Fabrication of porous gallium nitride by photoelectrochemical etching method

Detalles Bibliográficos
Autores principales: Cheah, Sook Fong, Ng, Sha Shiong
Lenguaje:eng
Publicado: Penerbit USM 2017
Materias:
Acceso en línea:http://cds.cern.ch/record/2713766
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author Cheah, Sook Fong
Ng, Sha Shiong
author_facet Cheah, Sook Fong
Ng, Sha Shiong
author_sort Cheah, Sook Fong
collection CERN
id cern-2713766
institution Organización Europea para la Investigación Nuclear
language eng
publishDate 2017
publisher Penerbit USM
record_format invenio
spelling cern-27137662021-04-21T18:09:20Zhttp://cds.cern.ch/record/2713766engCheah, Sook FongNg, Sha ShiongFabrication of porous gallium nitride by photoelectrochemical etching methodEngineeringPenerbit USMoai:cds.cern.ch:27137662017
spellingShingle Engineering
Cheah, Sook Fong
Ng, Sha Shiong
Fabrication of porous gallium nitride by photoelectrochemical etching method
title Fabrication of porous gallium nitride by photoelectrochemical etching method
title_full Fabrication of porous gallium nitride by photoelectrochemical etching method
title_fullStr Fabrication of porous gallium nitride by photoelectrochemical etching method
title_full_unstemmed Fabrication of porous gallium nitride by photoelectrochemical etching method
title_short Fabrication of porous gallium nitride by photoelectrochemical etching method
title_sort fabrication of porous gallium nitride by photoelectrochemical etching method
topic Engineering
url http://cds.cern.ch/record/2713766
work_keys_str_mv AT cheahsookfong fabricationofporousgalliumnitridebyphotoelectrochemicaletchingmethod
AT ngshashiong fabricationofporousgalliumnitridebyphotoelectrochemicaletchingmethod