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Epitaxy of semiconductors: physics and fabrication of heterostructures
The extended and revised edition of this textbook provides essential information for a comprehensive upper-level graduate course on the crystalline growth of semiconductor heterostructures. Heteroepitaxy is the basis of today’s advanced electronic and optoelectronic devices, and it is considered one...
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Lenguaje: | eng |
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Springer
2020
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Acceso en línea: | https://dx.doi.org/10.1007/978-3-030-43869-2 http://cds.cern.ch/record/2727029 |
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author | Pohl, Udo W |
author_facet | Pohl, Udo W |
author_sort | Pohl, Udo W |
collection | CERN |
description | The extended and revised edition of this textbook provides essential information for a comprehensive upper-level graduate course on the crystalline growth of semiconductor heterostructures. Heteroepitaxy is the basis of today’s advanced electronic and optoelectronic devices, and it is considered one of the most important fields in materials research and nanotechnology. The book discusses the structural and electronic properties of strained epitaxial layers, the thermodynamics and kinetics of layer growth, and it describes the major growth techniques: metalorganic vapor-phase epitaxy, molecular-beam epitaxy, and liquid-phase epitaxy. It also examines in detail cubic and hexagonal semiconductors, strain relaxation by misfit dislocations, strain and confinement effects on electronic states, surface structures, and processes during nucleation and growth. Requiring only minimal knowledge of solid-state physics, it provides natural sciences, materials science and electrical engineering students and their lecturers elementary introductions to the theory and practice of epitaxial growth, supported by references and over 300 detailed illustrations. |
id | cern-2727029 |
institution | Organización Europea para la Investigación Nuclear |
language | eng |
publishDate | 2020 |
publisher | Springer |
record_format | invenio |
spelling | cern-27270292021-04-21T18:05:35Zdoi:10.1007/978-3-030-43869-2http://cds.cern.ch/record/2727029engPohl, Udo WEpitaxy of semiconductors: physics and fabrication of heterostructuresOther Fields of PhysicsThe extended and revised edition of this textbook provides essential information for a comprehensive upper-level graduate course on the crystalline growth of semiconductor heterostructures. Heteroepitaxy is the basis of today’s advanced electronic and optoelectronic devices, and it is considered one of the most important fields in materials research and nanotechnology. The book discusses the structural and electronic properties of strained epitaxial layers, the thermodynamics and kinetics of layer growth, and it describes the major growth techniques: metalorganic vapor-phase epitaxy, molecular-beam epitaxy, and liquid-phase epitaxy. It also examines in detail cubic and hexagonal semiconductors, strain relaxation by misfit dislocations, strain and confinement effects on electronic states, surface structures, and processes during nucleation and growth. Requiring only minimal knowledge of solid-state physics, it provides natural sciences, materials science and electrical engineering students and their lecturers elementary introductions to the theory and practice of epitaxial growth, supported by references and over 300 detailed illustrations.Springeroai:cds.cern.ch:27270292020 |
spellingShingle | Other Fields of Physics Pohl, Udo W Epitaxy of semiconductors: physics and fabrication of heterostructures |
title | Epitaxy of semiconductors: physics and fabrication of heterostructures |
title_full | Epitaxy of semiconductors: physics and fabrication of heterostructures |
title_fullStr | Epitaxy of semiconductors: physics and fabrication of heterostructures |
title_full_unstemmed | Epitaxy of semiconductors: physics and fabrication of heterostructures |
title_short | Epitaxy of semiconductors: physics and fabrication of heterostructures |
title_sort | epitaxy of semiconductors: physics and fabrication of heterostructures |
topic | Other Fields of Physics |
url | https://dx.doi.org/10.1007/978-3-030-43869-2 http://cds.cern.ch/record/2727029 |
work_keys_str_mv | AT pohludow epitaxyofsemiconductorsphysicsandfabricationofheterostructures |