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Epitaxy of semiconductors: physics and fabrication of heterostructures

The extended and revised edition of this textbook provides essential information for a comprehensive upper-level graduate course on the crystalline growth of semiconductor heterostructures. Heteroepitaxy is the basis of today’s advanced electronic and optoelectronic devices, and it is considered one...

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Autor principal: Pohl, Udo W
Lenguaje:eng
Publicado: Springer 2020
Materias:
Acceso en línea:https://dx.doi.org/10.1007/978-3-030-43869-2
http://cds.cern.ch/record/2727029
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author Pohl, Udo W
author_facet Pohl, Udo W
author_sort Pohl, Udo W
collection CERN
description The extended and revised edition of this textbook provides essential information for a comprehensive upper-level graduate course on the crystalline growth of semiconductor heterostructures. Heteroepitaxy is the basis of today’s advanced electronic and optoelectronic devices, and it is considered one of the most important fields in materials research and nanotechnology. The book discusses the structural and electronic properties of strained epitaxial layers, the thermodynamics and kinetics of layer growth, and it describes the major growth techniques: metalorganic vapor-phase epitaxy, molecular-beam epitaxy, and liquid-phase epitaxy. It also examines in detail cubic and hexagonal semiconductors, strain relaxation by misfit dislocations, strain and confinement effects on electronic states, surface structures, and processes during nucleation and growth. Requiring only minimal knowledge of solid-state physics, it provides natural sciences, materials science and electrical engineering students and their lecturers elementary introductions to the theory and practice of epitaxial growth, supported by references and over 300 detailed illustrations.
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spelling cern-27270292021-04-21T18:05:35Zdoi:10.1007/978-3-030-43869-2http://cds.cern.ch/record/2727029engPohl, Udo WEpitaxy of semiconductors: physics and fabrication of heterostructuresOther Fields of PhysicsThe extended and revised edition of this textbook provides essential information for a comprehensive upper-level graduate course on the crystalline growth of semiconductor heterostructures. Heteroepitaxy is the basis of today’s advanced electronic and optoelectronic devices, and it is considered one of the most important fields in materials research and nanotechnology. The book discusses the structural and electronic properties of strained epitaxial layers, the thermodynamics and kinetics of layer growth, and it describes the major growth techniques: metalorganic vapor-phase epitaxy, molecular-beam epitaxy, and liquid-phase epitaxy. It also examines in detail cubic and hexagonal semiconductors, strain relaxation by misfit dislocations, strain and confinement effects on electronic states, surface structures, and processes during nucleation and growth. Requiring only minimal knowledge of solid-state physics, it provides natural sciences, materials science and electrical engineering students and their lecturers elementary introductions to the theory and practice of epitaxial growth, supported by references and over 300 detailed illustrations.Springeroai:cds.cern.ch:27270292020
spellingShingle Other Fields of Physics
Pohl, Udo W
Epitaxy of semiconductors: physics and fabrication of heterostructures
title Epitaxy of semiconductors: physics and fabrication of heterostructures
title_full Epitaxy of semiconductors: physics and fabrication of heterostructures
title_fullStr Epitaxy of semiconductors: physics and fabrication of heterostructures
title_full_unstemmed Epitaxy of semiconductors: physics and fabrication of heterostructures
title_short Epitaxy of semiconductors: physics and fabrication of heterostructures
title_sort epitaxy of semiconductors: physics and fabrication of heterostructures
topic Other Fields of Physics
url https://dx.doi.org/10.1007/978-3-030-43869-2
http://cds.cern.ch/record/2727029
work_keys_str_mv AT pohludow epitaxyofsemiconductorsphysicsandfabricationofheterostructures