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Chemical-mechanical polishing of low dielectric constant polymers and organosilicate glasses: fundamental mechanisms and application to IC interconnect technology

Detalles Bibliográficos
Autores principales:	Borst, Christopher Lyle, Gill, William N, Gutmann, Ronald J
Lenguaje:	eng
Publicado:	Springer 2002
Materias:	XX
Acceso en línea:	http://cds.cern.ch/record/2757502

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