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Characterization and control of wafer charging effects during high-current ion implantation
| Autores principales: | , , , , , , |
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| Lenguaje: | eng |
| Publicado: |
1994
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| Materias: | |
| Acceso en línea: | http://cds.cern.ch/record/277742 |
| _version_ | 1780887672306270208 |
|---|---|
| author | Current, M I Lukaszek, W Dixon, W Vella, M C Messick, C Shideler, J Reno, S |
| author_facet | Current, M I Lukaszek, W Dixon, W Vella, M C Messick, C Shideler, J Reno, S |
| author_sort | Current, M I |
| collection | CERN |
| id | cern-277742 |
| institution | Organización Europea para la Investigación Nuclear |
| language | eng |
| publishDate | 1994 |
| record_format | invenio |
| spelling | cern-2777422019-09-30T06:29:59Zhttp://cds.cern.ch/record/277742engCurrent, M ILukaszek, WDixon, WVella, M CMessick, CShideler, JReno, SCharacterization and control of wafer charging effects during high-current ion implantationEngineeringLBL-35962oai:cds.cern.ch:2777421994 |
| spellingShingle | Engineering Current, M I Lukaszek, W Dixon, W Vella, M C Messick, C Shideler, J Reno, S Characterization and control of wafer charging effects during high-current ion implantation |
| title | Characterization and control of wafer charging effects during high-current ion implantation |
| title_full | Characterization and control of wafer charging effects during high-current ion implantation |
| title_fullStr | Characterization and control of wafer charging effects during high-current ion implantation |
| title_full_unstemmed | Characterization and control of wafer charging effects during high-current ion implantation |
| title_short | Characterization and control of wafer charging effects during high-current ion implantation |
| title_sort | characterization and control of wafer charging effects during high-current ion implantation |
| topic | Engineering |
| url | http://cds.cern.ch/record/277742 |
| work_keys_str_mv | AT currentmi characterizationandcontrolofwaferchargingeffectsduringhighcurrentionimplantation AT lukaszekw characterizationandcontrolofwaferchargingeffectsduringhighcurrentionimplantation AT dixonw characterizationandcontrolofwaferchargingeffectsduringhighcurrentionimplantation AT vellamc characterizationandcontrolofwaferchargingeffectsduringhighcurrentionimplantation AT messickc characterizationandcontrolofwaferchargingeffectsduringhighcurrentionimplantation AT shidelerj characterizationandcontrolofwaferchargingeffectsduringhighcurrentionimplantation AT renos characterizationandcontrolofwaferchargingeffectsduringhighcurrentionimplantation |