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Characterization and control of wafer charging effects during high-current ion implantation

Detalles Bibliográficos
Autores principales:	Current, M I, Lukaszek, W, Dixon, W, Vella, M C, Messick, C, Shideler, J, Reno, S
Lenguaje:	eng
Publicado:	1994
Materias:	Engineering
Acceso en línea:	http://cds.cern.ch/record/277742

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