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Afterglow dynamics of plasma potential in bipolar HiPIMS discharges
In bipolar magnetron sputtering, the plasma afterglow is initiated by switching the target bias from a negative to positive voltage. In the following, the plasma potential evolution in this configuration is characterized, being responsible for the ion acceleration at the substrate sheath potential f...
| Autores principales: | , , , |
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| Lenguaje: | eng |
| Publicado: |
2021
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| Materias: | |
| Acceso en línea: | https://dx.doi.org/10.1088/1361-6595/ac2aed http://cds.cern.ch/record/2792377 |