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The impact of H$_2$ and N$_2$ on the material properties and secondary electron yield of sputtered amorphous carbon films for anti-multipacting applications
Amorphous carbon thin films were prepared by direct current hollow cathode sputter deposition in Ar discharge with the injection of small amounts of H$_2$ and/or N$_2$. The influence of these additives on the film properties with particular focus on the application as a coating for electron cloud mi...
| Autores principales: | , , , , , , |
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| Lenguaje: | eng |
| Publicado: |
2021
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| Materias: | |
| Acceso en línea: | https://dx.doi.org/10.1016/j.apsusc.2020.148552 http://cds.cern.ch/record/2810006 |