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Ion implantation, sputtering and their applications
Autores principales: | , , |
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Lenguaje: | eng |
Publicado: |
Academic Press
1976
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Materias: | |
Acceso en línea: | http://cds.cern.ch/record/282550 |
_version_ | 1780888048278437888 |
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author | Townsend, P D Hartley, N E W Kelly, J C |
author_facet | Townsend, P D Hartley, N E W Kelly, J C |
author_sort | Townsend, P D |
collection | CERN |
id | cern-282550 |
institution | Organización Europea para la Investigación Nuclear |
language | eng |
publishDate | 1976 |
publisher | Academic Press |
record_format | invenio |
spelling | cern-2825502021-04-22T03:38:55Zhttp://cds.cern.ch/record/282550engTownsend, P DHartley, N E WKelly, J CIon implantation, sputtering and their applicationsOther Fields of PhysicsAcademic Pressoai:cds.cern.ch:2825501976 |
spellingShingle | Other Fields of Physics Townsend, P D Hartley, N E W Kelly, J C Ion implantation, sputtering and their applications |
title | Ion implantation, sputtering and their applications |
title_full | Ion implantation, sputtering and their applications |
title_fullStr | Ion implantation, sputtering and their applications |
title_full_unstemmed | Ion implantation, sputtering and their applications |
title_short | Ion implantation, sputtering and their applications |
title_sort | ion implantation, sputtering and their applications |
topic | Other Fields of Physics |
url | http://cds.cern.ch/record/282550 |
work_keys_str_mv | AT townsendpd ionimplantationsputteringandtheirapplications AT hartleynew ionimplantationsputteringandtheirapplications AT kellyjc ionimplantationsputteringandtheirapplications |