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Ion implantation, sputtering and their applications

Detalles Bibliográficos
Autores principales: Townsend, P D, Hartley, N E W, Kelly, J C
Lenguaje:eng
Publicado: Academic Press 1976
Materias:
Acceso en línea:http://cds.cern.ch/record/282550
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author Townsend, P D
Hartley, N E W
Kelly, J C
author_facet Townsend, P D
Hartley, N E W
Kelly, J C
author_sort Townsend, P D
collection CERN
id cern-282550
institution Organización Europea para la Investigación Nuclear
language eng
publishDate 1976
publisher Academic Press
record_format invenio
spelling cern-2825502021-04-22T03:38:55Zhttp://cds.cern.ch/record/282550engTownsend, P DHartley, N E WKelly, J CIon implantation, sputtering and their applicationsOther Fields of PhysicsAcademic Pressoai:cds.cern.ch:2825501976
spellingShingle Other Fields of Physics
Townsend, P D
Hartley, N E W
Kelly, J C
Ion implantation, sputtering and their applications
title Ion implantation, sputtering and their applications
title_full Ion implantation, sputtering and their applications
title_fullStr Ion implantation, sputtering and their applications
title_full_unstemmed Ion implantation, sputtering and their applications
title_short Ion implantation, sputtering and their applications
title_sort ion implantation, sputtering and their applications
topic Other Fields of Physics
url http://cds.cern.ch/record/282550
work_keys_str_mv AT townsendpd ionimplantationsputteringandtheirapplications
AT hartleynew ionimplantationsputteringandtheirapplications
AT kellyjc ionimplantationsputteringandtheirapplications