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Ion implantation, sputtering and their applications

Detalles Bibliográficos
Autores principales:	Townsend, P D, Hartley, N E W, Kelly, J C
Lenguaje:	eng
Publicado:	Academic Press 1976
Materias:	Other Fields of Physics
Acceso en línea:	http://cds.cern.ch/record/282550

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