Plasma-assisted coatings for applications in ultrahigh vacuum

<!--HTML--><p><span style="color:#4e5f70;"><span>Physical Vapor Deposition (PVD) with plasma assistance offer great flexibility to produce coatings that are ultrahigh vacuum (UHV) compatible and designed to improve surface properties with respect to applications. Among the applications are those for accelerators: coatings that help to achieve and maintain UHV, i.e., getter coatings, coatings that help to dissipate heat, i.e., high emissivity coatings, and coatings that suppress the emission of secondary electrons.</span><span style="mso-spacerun:yes;">&nbsp;</span><span>Some of those requirements came directly from accelerator development: they are well known at CERN or even developed at CERN.</span><span style="mso-spacerun:yes;">&nbsp; </span><span>Therefore, this talk will focus on selected plasma deposition aspects of producing such coatings, with some work done at Berkeley Lab in prior years, supplemented by information on more recent developments on high power impulse magnetron sputtering as a modern form of sputter deposition technology.</span><span style="mso-spacerun:yes;">&nbsp;</span></span></p><p>Coffee / tea will be served after the seminar next to the Council Chamber.</p><p><span style="color:#4e5f70;"><strong>ATS Seminar Organisers:</strong> A. Dallocchio (EN), E. Metral (BE), M. Modena (ATS-DO), T. Stora (SY)</span></p><p><a href="https://cern.service-now.com/service-portal?id=privacy_policy&amp;se=ats-do-administrative&amp;notice=speaker-ATS-seminar">Data privacy notice</a></p>